AMAT Applied Materials  0010-17814端点探测器 

1.产 品 资 料 介 绍：

AMAT Applied Materials 0010-17814 端点探测器

核心规格

功能特点

• 高精度检测：可识别纳米级薄膜变化，确保刻蚀深度精确控制
• 实时监控：连续监测工艺过程，及时捕捉终点，提高工艺重复性
• 非接触测量：光学测量方式避免对晶圆表面造成物理损伤
• 抗干扰能力：特殊光学设计，减少等离子体和背景光干扰
• 多模式检测：支持反射、干涉等多种检测模式，适应不同工艺需求
• 远程诊断：通过通信接口实现参数配置与状态监控

典型应用

• 硅及硅化合物刻蚀终点检测
• 金属薄膜刻蚀过程监控
• 介质层刻蚀深度控制
• 多层薄膜结构的选择性刻蚀
• 各种需要精确控制刻蚀深度的工艺

AMAT Applied Materials 0010-17814端点探测器 英文资料：

AMAT Applied Materials 0010-17814 Endpoint Detector

AMAT 0010-17814 is a high-precision optical endpoint detector designed specifically for etching processes in semiconductor manufacturing. It is used to monitor the process endpoint on the wafer surface in real-time, ensuring precise control of etching depth and pattern size.

e777乐彩线路检测Core specifications

Project specification remarks

Suitable for platforms such as Centura, Endura, P5000, etc., compatible with multiple etching systems

Detection principle: laser reflection/interference measurement, high-sensitivity optical detection

e777乐彩线路检测Light source type visible/near-infrared laser wavelength depends on the model

Detection range: Nano level surface changes can detect changes in film thickness

Quick capture of process endpoint in microseconds with response time

Installation method: Vacuum flange installation, compatible with standard CF/ISO flanges

Working temperature 0-50 ° C, industrial grade environmental adaptability

Vacuum compatibility 1 × 10 ⁻⁵ Torr suitable for high vacuum process environments

e777乐彩线路检测Communication interface RS-485/Ethernet supports data transmission and control

Features

e777乐彩线路检测High precision detection: capable of identifying nanoscale film changes, ensuring precise control of etching depth

Real time monitoring: Continuously monitor the process, capture endpoints in a timely manner, and improve process repeatability

e777乐彩线路检测Non contact measurement: Optical measurement method avoids physical damage to the wafer surface

e777乐彩线路检测Anti interference capability: Special optical design to reduce plasma and background light interference

e777乐彩线路检测Multi mode detection: supports multiple detection modes such as reflection and interference, adapting to different process requirements

Remote diagnosis: parameter configuration and status monitoring through communication interface

Typical Applications

e777乐彩线路检测End point detection of silicon and silicon compound etching

Monitoring of Metal Thin Film Etching Process

e777乐彩线路检测Depth control of dielectric layer etching

Selective etching of multi-layer thin film structures

e777乐彩线路检测Various processes that require precise control of etching depth

AMAT Applied Materials 0010-17814端点探测器 e777乐彩线路检测      

 产品视频

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