AMAT Applied Materials 0010-08670顶盖
1.产 品 资 料 介 绍:
关键参数
性能特点
典型应用
AMAT Applied Materials 0010-08670顶盖 英文资料:
The top cover of AMAT Applied Materials 0010-08670 is a sealed end cover for semiconductor equipment vacuum chambers. The material is usually corrosion-resistant 5083 aluminum alloy, and the surface is treated with hard anodizing. It can work stably for a long time in an environment with a vacuum degree of 10 ⁻⁵ Pa at 0-40 ℃.
e777乐彩线路检测key parameters
e777乐彩线路检测Project specification remarks
e777乐彩线路检测Suitable for multi chamber platforms such as Centura, Endura, P5000, etc. to adapt to 200mm/300mm wafer processes
Material: 5083 aluminum alloy, corrosion-resistant, low stress, thermal expansion coefficient matched with the cavity
e777乐彩线路检测Surface treatment: Hard anodizing (inner side) film thickness meets SEMATECH standards
Sealing form: Metal sealing ring or fluororubber O-ring can withstand acid, alkali and plasma corrosion
Customized external dimensions, commonly ranging from Φ 800 to 1000 mm depending on the diameter of the cavity
Weight ≈ 80-150 kg, reduced by about 50% compared to stainless steel
Working temperature 0-40 ℃, recommended temperature control ± 2 ℃
e777乐彩线路检测Vacuum level 10 ⁻⁵ Pa leakage rate<1 × 10 ⁻⁹ mbar · L/s
e777乐彩线路检测Certification: SEMI S2, CE, UL comply with semiconductor industry safety standards
e777乐彩线路检测Performance Characteristics
e777乐彩线路检测High precision sealing: When the temperature fluctuates by ± 2 ℃, the deformation of the sealing surface is only about 0.01 mm, effectively extending the life of the sealing ring.
Low stress design: matched with the thermal expansion coefficient of the cavity material, reducing thermal cycling stress and preventing seal failure.
Strong corrosion resistance: The inner hard oxide layer can withstand process environments such as plasma, acid and alkali.
e777乐彩线路检测Easy to maintain: lightweight, supports quick replacement by two people, reduces downtime.
Typical Applications
Etch and CVD systems
Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) Systems
Ion implantation machine and wafer transfer chamber
AMAT Applied Materials 0010-08670顶盖 e777乐彩线路检测

产品视频
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4.其他英文产品
| S21HNNA-HGNL-00 | SC724A-001 | SCE955NN-501-01 |
| S21GNNA-RNNC-00 | SC453-038-15 | SC904-021-01 |
| RSER200-4 | SC723B001-01 | SCE903A3-002-01 |
| RMV-142D | SC726A-001-PM72013 | SCE903AN-002-01 |
| RMV-132D | SC723A-001-PM72008 | SN31HCYR-LNK-NS-01 |
| RMV-122D | SC102-001 | S34GNNA-HGNE-00 |
The content is from Ruichang Mingsheng Automation Equipment Co., LTD
Contact: +86 15270269218




