AMAT Applied Materials 0190-34229流量控制器

1.产 品 资 料 介 绍：

产品概述

AMAT 0190-34229 流量控制器是 Applied Materials 半导体工艺设备中用于精确控制气体流量的关键模块。它通常用于化学气相沉积（CVD）、物理气相沉积（PVD）、刻蚀（Etch）等工艺中，对工艺气体的流量进行精准调节，以确保工艺参数稳定和工艺质量一致性。

技术参数（典型特征）

• 类型：质量流量控制器（MFC）

• 功能：精确控制气体流量，实现闭环流量调节

• 流量范围：通常从几 sccm 到几千 sccm（具体依工艺需求）

• 精度：高精度流量控制（误差通常 ±1%~±2% FS）

• 接口类型：数字或模拟输入/输出，可与控制器或 PLC 联动

• 控制方式：闭环控制，支持实时反馈调节

• 工作环境：洁净室兼容，耐化学腐蚀、适应半导体工艺条件

• 兼容设备：Applied Materials 各类沉积、刻蚀及离子注入设备

应用场景

1. 工艺气体流量控制

   • e777乐彩线路检测精确调节反应气体或载气流量，确保工艺稳定性。

2. 半导体沉积与刻蚀工艺

   • e777乐彩线路检测对 CVD、PVD 或 Etch 工艺中的气体配比和流速进行控制，提高薄膜均匀性和重复性。

3. 工艺参数监控

   • 实时采集流量数据，反馈至数字控制器，实现闭环调节。

4. 设备维护与校准

   • 支持模块化更换与校准，减少停机时间并保证精度。

AMAT Applied Materials 0190-34229流量控制器 英文资料：

Product Overview

e777乐彩线路检测The AMAT 0190-34229 flow controller is a key module used in Applied Materials semiconductor process equipment for precise control of gas flow. It is commonly used in chemical vapor deposition (CVD), physical vapor deposition (PVD), etching (Etch) and other processes to precisely adjust the flow rate of process gases to ensure stable process parameters and consistent process quality.

e777乐彩线路检测Technical parameters (typical features)

Type: Mass Flow Controller (MFC)

Function: Accurately control gas flow and achieve closed-loop flow regulation

Flow range: usually from a few sccm to several thousand sccm (depending on process requirements)

Accuracy: High precision flow control (error usually ± 1%~± 2% FS)

e777乐彩线路检测Interface type: digital or analog input/output, can be linked with a controller or PLC

Control mode: closed-loop control, supporting real-time feedback adjustment

Work environment: cleanroom compatible, chemically resistant, and adaptable to semiconductor process conditions

Compatible devices: Various deposition, etching, and ion implantation equipment from Applied Materials

Application scenarios

e777乐彩线路检测Process gas flow control

Accurately adjust the flow rate of reaction gas or carrier gas to ensure process stability.

Semiconductor deposition and etching processes

Control the gas ratio and flow rate in CVD, PVD, or Etch processes to improve film uniformity and repeatability.

Process parameter monitoring

e777乐彩线路检测Real time collection of traffic data, feedback to the digital controller, to achieve closed-loop regulation.

Equipment maintenance and calibration

Support modular replacement and calibration to reduce downtime and ensure accuracy.

AMAT Applied Materials 0190-34229流量控制器  e777乐彩线路检测      

 产品视频

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4.其他英文产品

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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